Enhancing CMP Process Control with Intelligent Line Monitoring & Integrated Metrology As semiconductor manufacturers push the boundaries of performance and functionality—driven by high-performance ...

Japanese conglomerate Fujifilm has opened a new facility for the production of Chemical Mechanical Polishing (CMP) slurries, a basic material used in semiconductor manufacturing process. CMP slurries ...

The semiconductor manufacturing industry continues to progress rapidly, with standards, materials and requirements evolving annually. Industry leaders leverage novel solutions to overcome their ...

The semiconductor manufacturing process involves many steps, including, but not limited to, film deposition, photolithography, etching, and chemical mechanical polishing (CMP). Contamination can ...

As the semiconductor industry enters the era beyond Moore's Law, the drive for atomic-scale precision in surface planarization becomes more critical than ever. Recognizing this challenge, researchers ...

Japan-based Fuso Chemical, the global leader in semiconductor CMP slurries with a 90% market share, is set to invest JPY 50 billion (US$350 million) in a significant production expansion. Despite the ...

Dr. Harini Bhuvaneswari Gunasekaran's particle-free polishing system aims to reduce defects and improve reliability in semiconductor manufacturing.

BenQ Materials is expanding into semiconductor materials, with president Ray Liu saying the company has entered CMP cleaning brush rollers and begun shipments to wafer fabs. It is also developing ...

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...